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Mark H. Rümmeli教授课题组在ACS Nano上发表论文

发布者:金霞发布时间:2017-05-10浏览次数:42

题目:Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOx by Chemical Vapor Deposition

作者:Jinbo Pang, Rafael G. Mendes, Pawel S. Wrobel, Michal D. Wlodarski,Huy Quang Ta,Liang Zhao, Lars Giebeler,Barbara Trzebicka,Thomas Gemming,Lei Fu, Zhongfan Liu,Juergen Eckert, Alicja Bachmatiuk,*and Mark H. Rümmeli*

摘要:To synthesize graphene by chemical vapor deposition (CVD) both in large area and with    uniform layer number directly over Si/SiOx has proven challenging. The use of catalytically active metal substrates, in particular Cu, has shown far greater success and therefore is popular. That said, for electronics applications it requires a transfer procedure, which tends to damage and contaminate the graphene. Thus, the direct fabrication of uniform graphene on Si/SiOx remains attractive. Here we show a facile confinement CVD approach in which we simply sandwichtwo Si wafers with their oxide faces in contact to form uniform monolayer graphene. A thorough examination of the material reveals it comprises faceted grains despite initially nucleating as round islands. Upon clustering, they facet to minimize their energy. This behavior leads to faceting in polygons, as the system aims to ideally form hexagons, the lowest energy form, much like the hexagonal cells in a beehive, which requires the minimum wax. This process also leads to a near minimal total grain boundary length per unit area. This fact, along with the high graphene quality, is reflected in its electrical performance, which is highly comparable with graphene formed over other substrates, including Cu. In addition, the graphene growth is self-terminating. Our CVD approach is easily scalable and will make graphene formation directly on Si wafers competitive against that from metal substrates, which suffer from transfer. Moreover, this CVD route should be applicable for the direct synthesis of other 2D materials and their van der Waals heterostructures.

影响因子:13.942

原文链接:https://pubs.acs.org/doi/10.1021/acsnano.6b08069